Investigation on dental etching patterns and water sorption via novel synthesized POSS nano-structures

the effect of novel polyhedral oligomeric silsesquioxane (POSS) as an etching monomer in dental adhesives on etching patterns of dental has been investigated in this study. This new type of POSS nano-structures have phosphonic acid and double bond functionality simultaneously, so, it can be used as a self-etching monomer. This kind of monomers make the micromechanical bonding between the adhesive and the dental surface. The micromechanical bonding makes the stronger bonding of the dental composite to the dental surface. By using ۱۵% of this nano-structure in dental self-etch adhesives, the etching pattern follows the honeycomb shape, and the depth of etching was equal to ~۱-۲ μm. Moreover, the water sorption decreases gradually from ۴.۳ to ۲.۸ percent. The pH of the resin after adding ۱۵ percent of PhAA-POSS significantly reduced from ۶ to ۱.۸