Electrophoretic deposition technique for coating nano TiO۲ on SS۳۱۶L alloy.

bstract: - The aim of this work was to use the electrophoretic deposition (EPD) technique for the deposition of nano-TiO۲ layers directly on an SS۳۱۶L substrate. The nano-TiO۲ films were deposited on an SS۳۱۶L alloy with various parameters, such as potential, time of deposition and annealed temperature—the optimum parameters required for the development of stable nano-TiO۲ layer coating. The results obtained from the X-ray diffraction (XRD) and FESEM tests in this study showed that the TiO۲ layers sintered at ۴۰۰ °C were amorphous. The XRD patterns showed the anatase phase at ۶۰۰ °C for ۱ h. The heat treatment of TiO۲ layers led to good adhesion with the SS۳۱۶L alloy. The heat treatment above ۵۰۰ °C led to the agglomeration of nano-TiO۲ layers from ۲۸ nm to ۷۸ nm at ۶۰۰ °C. The thickness of the nano-TiO۲ coating increased with the deposition time and potential. The optimum thickness of the nano-TiO۲ coating on the SS۳۱۶L alloy was ۵۰ µm at ۵ min and ۳۰ V. The increase in coating thickness with the time and potential of deposition led to problems, including increases in roughness and weak adhesion of the coating layer.