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مقالات فارسیISIکنفرانسهاژورنالها

Chsracterization of Low Temperature Plasma Ion Nitriding (PIN) of Inconel ۶۰۰ and ۶۰۱ Alloys

محل انتشار: مجله علم مواد و مهندسی ایران، دوره: 17، شماره: 2
سال انتشار: 1399
نوع سند: مقاله ژورنالی
زبان: انگلیسی
مشاهده: 138

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استخراج به نرم افزارهای پژوهشی:

لینک ثابت به این مقاله:
https://civilica.com/doc/1606428

شناسه ملی سند علمی:

JR_IJMSEI-17-2_008

تاریخ نمایه سازی: 1 اسفند 1401

چکیده مقاله:

In this study an effort has been made for the plasma ion nitriding (PIN) of Inconel ۶۰۰ and ۶۰۱ alloys at low temperatures. After plasma ion nitriding, microstructure study, growth kinetics of nitrided layer formation and wear properties were investigated by various characterization techniques such as; scanning electron microscope (SEM), X-ray diffraction (XRD) analysis, micro-hardness measurement and wear test by pin on disk technique. It was found that, surface micro-hardness increases after PIN process. A mix peak of epsilon (ε) phase with fcc (γ) phase was detected for all temperature range (۳۵۰ ۰C to ۴۵۰ ۰C), while the chromium nitride (CrN) phase was detected at elevated temperature range ~۴۵۰ ۰C in inconel ۶۰۱ alloy. The calculated values of diffusion coefficient and activation energy for diffusion of nitrogen are in accordance with the literature. Volume loss and wear rate of the plasma nitrided samples decreases, but it increases as PIN process temperature increases.

کلیدواژه ها:

Micro-hardness ، X-ray diffraction ، Wear test ، Diffusion coefficient ، Plasma nitriding.

نویسندگان

R. Kumar

Birla Institute of Technology, Mesra Jaipur Campus

Y. Chandra Sharma

Vivekananda Global University, Jaipur, India

V. Vidya Sagar

Malviya National Institute of Technology, Jaipur, India

D. Bhardwaj

Birla Institute of Technology, Mesra, Jaipur Campus, India

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