Influence of ion-neutral collision parameters on dynamic structure of magnetized sheath during plasma immersion ion implantation

A cold magnetized plasma sheath is consideredto examine the gas pressure effect on the sheath dynamics.A fluid model is used to describe the plasma sheathdynamic. The governing fluid equations in the plasma aresolved from plasma center to the target using the finitedifference method and some convenient initial andboundary conditions at the plasma center and target. It isfound that, the ion-neutral collision has significant effect onthe dynamic characteristics of the high-voltage sheath inthe plasma immersion ion implantation (PIII). It meansthat, the temporal profile of the ion dose on the target andsheath width are decreased by increasing the gas pressure.Also, the gas pressure substantially diminishes the temporalpsychograph of ion incident angle on the target.